UV Laser Symposium Draws a Crowd

FORT LAUDERDALE, FL, Nov. 3 -- Lambda Physik welcomed nearly 100 participants to its Second International UV Laser Symposium held October 13-14 at the Marriott Harbor Beach Resort in Fort Lauderdale, FL.

"Industry leaders are clearly recognizing that 157 nm is fast becoming the next wavelength of choice," said Dr. Dirk Basting, co-founder and president of Lambda Physik. "More and more researchers are studying its capabilities both from an industrial and scientific perspective. The overwhelming response from this symposium indicates that there is a great deal of interest in F2 and that is a viable industrial light source."

During the symposium, industry experts and researchers such as Professor Henry Rothschild (MIT), Rich Harbison (Sematech), and Professor Peter Herman (University of Toronto) presented their latest research results and discussed the broad spectrum of applications for 157 nm. Topics included:

• the fabrication of diffractive optical elements by direct etching of fused silica with a 157 nm laser;
• advantages of F2 lasers in precise surface shaping and refractive index profiling for a broad range of photonics and telecommunications applications;
• detailed analysis of alcohol chemistries in a fraction of the time and complexity of existing techniques;
• the use of 157 nm for analyzing geological samples that will help scientists understand and age materials, as well as monitor soils for pollutants;
• rapid prototyping and shaping of fused silica lenses by direct etching with 157 nm light;
• review of the 157 nm lithography program at SVGL- risk areas, risk mitigation, and partnerships;
• fabrication of microfluidic cells in fused silica, Teflon, and PMMA.

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