SANTA CLARA, CA -- Lambda Physik  has introduced two new models of the NovaLine® family of microlithography excimer lasers. These products include KrF lasers for today's microlithography at 248 nm, as well as ArF and F2 lasers for the future development of optical lithography at 193 nm and 157 nm. 

The NovaLine® K2000 laser (KrF ­ 248 nm) delivers 20 W of output power at a 2 kHz repetition rate with a spectral purity of less than 0.6 pm. Lambda Physik says that when combined with a high NA stepper or scanner, this laser enables tight dose control to less than ± 0.25%. 

The NovaLine® A1000 laser (ArF ­ 193 nm) provides 5 W of output power at a 1 kHz repetition rate with a bandwidth of only 0.6 pm. According to the company, it has produced more than 21 W of output power in the lab, allowing pulse stretching up to 60 ns (T_is) to reduce optical damage. Lambda Physik says that this second-generation laser enables process development and pilot production at 193 nm. 

The NovaLine® F500 is a fluorine laser (F2 ­ 157 nm) targeted for process development of optical lithography at feature sizes below 0.1 µm.